SISS-20 has finished in great success!! We appreciate all the participants.
Poster Award (named “Karen Award”) was designed for the following two researchers.
P-4
Mass Separation of AuGe Alloy Using Rotating Electric Fields (Ⅱ)
Tokio Norikawa (Tokyo University of Science)
P-7
Matrix and Element Dependences of Useful Yield in Si and SiO2 Matrices Using Laser-Ionization Sputtered Neutral Mass Spectrometry
Reiko Saito (Toshiba Memory Corporation)
Outline
SISS-20 will be held on 28th (Thu) and 29th (Fri) June 2018 at Seikei University, Tokyo Japan.
SISS-20 will cover SIMS and related techniques based on ion-solid interactions: fundamentals, instrumentation, and application in various fields, such as semiconductors, industrial materials, biological, medical, and environmental sciences.
■Meeting Room on the 4th floor, University Building #14
Programs(temporary)
at a glance
SISS20 Sponsors
Platinum ：AMETEK・ULVAK-PHI・TOYAMA・HITACHI High-Tech・EAG LABORATORIES・Sanyo Trading
Daiamond ：scientaomicron・TORAY
Gold ：iNNOVATION SCIENCE・Thermo Fisher SCIENTIFIC・エルミネット株式会社・APCO
Invited Speakers
Rasmus Havelund (National Physical Laboratory)
Dieter Isheim (Northwestern University)
Motoo Ito (Japan Agency for Marine-Earth Science and Technology)
Yuji Kataoka (Fujitsu Laboratories Ltd.)
Jae Young Kim (Daegu Gyeongbuk Institute of Science & Technology)
Haiyang Li (Dalian Institute of Chemical Physics, Chinese Academy of Sciences)
Ichiro Mihara (KURARAY)
Naoya Sakamoto (Hokkaido University)
Joseph Ellis (University of Illinois)
Miyuki Takeuchi (University of Tokyo)
Wilfried Vandervorst (IMEC, KU Leuven)
Fuyi Wang (Institute of Chemistry, Chinese Academy of Sciences)
Roger Webb (University of Surrey)
Call for papers
Already Closed
In SISS-20, Poster Award (named “Karen Award”) will be designed for the most outstanding presentation of research.
Abstract Submission
All invited and contributed presenters are requested to write abstracts. Please send a MS-Word or PDF file of your abstract (A4 page size, within 2 pages (1 page or 2 pages) by e-mail to the following address.
Maximum Poster Size: 850mm x 1200mm(Poster board size: 900 mm × 1800 mm)
Registration
Registration can be accepted also in Japanese.
Registration fees: Regular 5,000 yen / Student 2,000 yen
Organizer
Hisayoshi Yurimoto (Hokkaido University)
Program Committee
Junichiro Sameshima (Toray Research Center)
Satoka Aoyagi (Seikei University)
Makishi Ishikawa (Ametek)
Retsu Oiwa (Scienta Omicron)
Masataka Ohgaki (Hitachi High-Tech Science)
Shinya Otomo (Furukawa Electric)
Masayuki Okamoto (Kao)
Masahiro Kudo (Seikei University)
Reiko Saito (Toshiba Memory Corporation)
Atsushi Sakaki (Nichia)
Takahiko Suzuki (ULVAC-PHI)
Akio Takano (Toyama)
Songsu Cho (Ametek)
Suguru Nishinomiya (Nippon Steel & Sumitomo Metal)
Satoshi Ninomiya (University of Yamanashi)
Masashi Nojima (Tokyo University of Science)
Jiro Matsuo (Kyoto University)
Ichiro Mihara (Kuraray)
Takayuki Yamagishi (Seikei University)
Yuta Yokoyama (Kochi National College of Technology)